Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer

Constantoudis, VassiliosVassiliosConstantoudisPapavieros, GeorgeGeorgePapavierosLorusso, GianGianLorussoRutigliani, VitoVitoRutiglianiVan Roey, FriedaFriedaVan RoeyGogolides, EvangelosEvangelosGogolides2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30458Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transferProceedings paperhttps://doi.org/10.1117/12.2306282