Limitations of shift-and-ratio based Leff extraction techniques for MOS transistors with halo or pocket implants

van Meer, HansHansvan MeerHenson, KirklenKirklenHensonLyu, Jeong-hoJeong-hoLyuRosmeulen, MaartenMaartenRosmeulenKubicek, StefanStefanKubicekCollaert, NadineNadineCollaertDe Meyer, KristinKristinDe Meyer2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4843Limitations of shift-and-ratio based Leff extraction techniques for MOS transistors with halo or pocket implantsJournal article