Kerber, AndreasAndreasKerberCartier, EduardEduardCartierPantisano, LuigiLuigiPantisanoDegraeve, RobinRobinDegraeveKauerauf, ThomasThomasKaueraufKim, Young-ChangYoung-ChangKimHou, A.A.HouGroeseneken, GuidoGuidoGroesenekenMaes, HermanHermanMaesSchwalke, U.U.Schwalke2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7728Origin of the threshold voltage instability in SiO2/HfO2 dual layer gate dielectricsJournal article