Van Driessche, VeerleVeerleVan DriesscheLucas, KevinKevinLucasVan Roey, FriedaFriedaVan RoeyGrozev, GrozdanGrozdanGrozevTzviatkov, PlamenPlamenTzviatkov2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5730Low-temperature 193nm resist reflow process for 100 nm generation contact patterningProceedings paper