Tritchkov, AlexanderAlexanderTritchkovRieger, M.M.RiegerStirniman, J.J.StirnimanYen, AnthonyAnthonyYenRonse, KurtKurtRonseVandenberghe, GeertGeertVandenbergheVan den hove, LucLucVan den hove2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/2187Optical proximity effects correction at 0.25 mm incorporating process variations in lithographyProceedings paper