Lorusso, GianGianLorussoOhashi, TakeyoshiTakeyoshiOhashiYamaguchi, AstukoAstukoYamaguchiInoue, OsamuOsamuInoueSutani, TakumichiTakumichiSutaniHoriguchi, NaotoNaotoHoriguchiBoemmels, JuergenJuergenBoemmelsWilson, ChrisChrisWilsonBriggs, BasoeneBasoeneBriggsTan, Chi LimChi LimTanRaymaekers, TomTomRaymaekersDelhougne, RomainRomainDelhougneVan den Bosch, GeertGeertVan den BoschDi Piazza, LucaLucaDi PiazzaKar, Gouri SankarGouri SankarKarFurnemont, ArnaudArnaudFurnemontFantini, AndreaAndreaFantiniDonadio, Gabriele LucaGabriele LucaDonadioSouriau, LaurentLaurentSouriauCrotti, DavideDavideCrottiYasin, FarrukhFarrukhYasinAppeltans, RafRafAppeltansRao, SiddharthSiddharthRaoDe Simone, DaniloDaniloDe SimoneRincon Delgadillo, PaulinaPaulinaRincon DelgadilloLeray, PhilippePhilippeLerayCharley, Anne-LaureAnne-LaureCharleyZhou, DaisyDaisyZhouVeloso, AnabelaAnabelaVelosoCollaert, NadineNadineCollaertHasumi, KazuhisaKazuhisaHasumiKoshihara, ShunsukeShunsukeKoshiharaIkota, MasamiMasamiIkotaOkagawa, YutakaYutakaOkagawaIshimoto, ToruToruIshimoto2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28857Enabling CD SEM metrology for 5nm technology node and beyondProceedings paper10.1117/12.2257468