Bender, HugoHugoBenderConard, ThierryThierryConardNohira, HiroshiHiroshiNohiraPétry, JasmineJasminePétryRichard, OlivierOlivierRichardZhao, ChaoChaoZhaoBrijs, BertBertBrijsBesling, WimWimBeslingDetavernier, C.C.DetavernierVandervorst, WilfriedWilfriedVandervorstCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe GendtChen, JianJianChenKluth, JonJonKluthTsai, WilmanWilmanTsaiMaes, JosJosMaes2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5054Physical characterization of high-k gate stacks deposited on HF-last surfacesProceedings paper