Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization

Pellens, NickNickPellensPhilipsen, VickyVickyPhilipsenFranke, Joern-HolgerJoern-HolgerFrankeRonse, KurtKurtRonseHendrickx, EricEricHendrickx2025-07-072025-05-112025-07-072024978-1-5106-8155-20277-786XWOS:001467876500004https://imec-publications.be/handle/20.500.12860/45649Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimizationProceedings paper10.1117/12.3033432978-1-5106-8156-9WOS:001467876500004