Wu, WenWenWuJonckheere, RikRikJonckheereTokei, ZsoltZsoltTokeiStucchi, MicheleMicheleStucchiStruyf, HerbertHerbertStruyfVos, IngridIngridVosBender, HugoHugoBenderMaex, KarenKarenMaex2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8414Resistivity of ultra-narrow Cu interconnects fabricated with ion beam lithographyProceedings paper