Implementation of 248nm based CD metrology for advanced reticle production

Hourd, AndrewAndrewHourdGrimshaw, AnthonyAnthonyGrimshawScheuring, GerdGerdScheuringGittinger, ChristianChristianGittingerDoebereiner, StefanStefanDoebereinerHillman, FrankFrankHillmanBrueck, Hans-JuergenHans-JuergenBrueckHartmann, HansHansHartmannOrdynskyy, VolodymyrVolodymyrOrdynskyyPeter, KaiKaiPeterChen, Shiuh-BinShiuh-BinChenChen, ParksonParksonChenJonckheere, RikRikJonckheerePhilipsen, VickyVickyPhilipsenSchaetz, ThomasThomasSchaetzSommer, KarlKarlSommer2021-10-152021-10-152003-01https://imec-publications.be/handle/20.500.12860/7663Implementation of 248nm based CD metrology for advanced reticle productionProceedings paper