Ge and GeSn chemical vapor deposition for Si based photonic devices

Vincent, BenjaminBenjaminVincentGencarelli, FedericaFedericaGencarelliVanherle, WendyWendyVanherleLoo, RogerRogerLooCaymax, MattyMattyCaymaxVan Campenhout, JorisJorisVan Campenhout2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20096Ge and GeSn chemical vapor deposition for Si based photonic devicesOral presentation