Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage

Rakhimova, T.T.RakhimovaLopaev, D.D.LopaevMankelevich, Y.Y.MankelevichRakhimov, A.A.RakhimovZyryanov, S.S.ZyryanovKurchikov, K.K.KurchikovNovikova, N.N.NovikovaBaklanov, MikhaïlMikhaïlBaklanov2021-10-222021-10-2220150022-3727https://imec-publications.be/handle/20.500.12860/25797Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damageJournal articlehttp://iopscience.iop.org/0022-3727/48/17/175203/