At the Extreme of 3D-NAND Scaling: 25 nm Z-Pitch with 10 nm Word Line Cells

Rachidi, SanaSanaRachidiArreghini, AntonioAntonioArreghiniVerreck, DevinDevinVerreckDonadio, Gabriele LucaGabriele LucaDonadioBanerjee, KaustuvKaustuvBanerjeeKatcko, KostantineKostantineKatckoOniki, YusukeYusukeOnikiVan den Bosch, GeertGeertVan den BoschRosmeulen, MaartenMaartenRosmeulen2022-11-172022-10-302022-11-1720222330-7978WOS:000869001800025https://imec-publications.be/handle/20.500.12860/40648At the Extreme of 3D-NAND Scaling: 25 nm Z-Pitch with 10 nm Word Line CellsProceedings paper10.1109/IMW52921.2022.9779303978-1-6654-9947-7WOS:000869001800025