Recent advances in fundamental understanding of reliability phenomena in downscaled copper interconnects

Croes, KristofKristofCroesWilson, ChrisChrisWilsonLofrano, MelinaMelinaLofranoBeyer, GeraldGeraldBeyerTokei, ZsoltZsoltTokei2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18755Recent advances in fundamental understanding of reliability phenomena in downscaled copper interconnectsOral presentation