Santoro, GaetanoGaetanoSantoroHouchens, KevinKevinHouchensBogdanowicz, JanuszJanuszBogdanowiczElizov, MosheMosheElizovYaron, LiorLiorYaronChemama, MichaelMichaelChemamaGoldenshtein, AlexAlexGoldenshteinZakay, AmitAmitZakayAmit, NoamNoamAmitBriggs, BasoeneBasoeneBriggsPacco, AntoineAntoinePaccoDelhougne, RomainRomainDelhougneCockburn, AndrewAndrewCockburnAbramovitz, YanivYanivAbramovitzTam, AviramAviramTamAdan, OferOferAdanMertens, HansHansMertensCharley, Anne-LaureAnne-LaureCharleyHoriguchi, NaotoNaotoHoriguchiLeray, PhilippePhilippeLerayLorusso, GianGianLorusso2022-12-132022-09-082022-12-132022978-1-5106-4981-10277-786XWOS:000844549800020https://imec-publications.be/handle/20.500.12860/40383Recess metrology challenges for 3D device architectures in advanced technology nodesProceedings paper10.1117/12.2613771978-1-5106-4982-8WOS:000844549800020