Degraeve, RobinRobinDegraeveKerber, AndreasAndreasKerberCartier, EdEdCartierPantisano, LuigiLuigiPantisanoGroeseneken, GuidoGuidoGroeseneken2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7479Characterization of charge trapping in SiO2/HfO2 dielectricsProceedings paper