Ni-FUSI on high-k as a candidate for 65nm LSTP CMOS

Kubicek, StefanStefanKubicekVeloso, AnabelaAnabelaVelosoKottantharayil, AnilAnilKottantharayilHayashi, ShigenoriShigenoriHayashiYamamoto, KazuhikoKazuhikoYamamotoMitsuhashi, RiichirouRiichirouMitsuhashiKittl, JorgeJorgeKittlLauwers, AnneAnneLauwersHorii, S.S.HoriiHarada, Y.Y.HaradaKubota, M.M.KubotaNiwa, MasaakiMasaakiNiwaDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsJurczak, GosiaGosiaJurczakBiesemans, SergeSergeBiesemans2021-10-162021-10-162005-04https://imec-publications.be/handle/20.500.12860/10727Ni-FUSI on high-k as a candidate for 65nm LSTP CMOSProceedings paper