Dual silicide technology: WSix polycide gate and self-aligned CoSi2 source/drain

Franssila, SamuliSamuliFranssilaPalmans, RogerRogerPalmansStone, M.M.StoneMaex, KarenKarenMaex2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/163Dual silicide technology: WSix polycide gate and self-aligned CoSi2 source/drainProceedings paper