The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation

Tan, Ling EeLing EeTanTreska, FergoFergoTreskaGillijns, WernerWernerGillijnsVan de Kerkhove, JeroenJeroenVan de KerkhoveDe Bisschop, PeterPeterDe BisschopPhilipsen, VickyVickyPhilipsenKim, Ryan Ryoung HanRyan Ryoung HanKim2025-08-292025-08-292024978-1-5106-8157-60277-786XWOS:001536747100028https://imec-publications.be/handle/20.500.12860/46129The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementationProceedings paper10.1117/12.3034348978-1-5106-8158-3WOS:001536747100028