Interlevel dielectric engineering for improved device performance in half-micron CMOS

Forester, LynnLynnForesterCollins, TomTomCollinsVan den Bosch, GeertGeertVan den BoschMeynen, HermanHermanMeynenCoenegrachts, BartBartCoenegrachtsVan den hove, LucLucVan den hove2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/159Interlevel dielectric engineering for improved device performance in half-micron CMOSProceedings paper