Surface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H2O2 Solutions

lebedev, MikhailMikhaillebedevMayer, ThomasThomasMayervan Dorp, DennisDennisvan DorpAbrenica, GranielGranielAbrenicaArnauts, SophiaSophiaArnautsAltamirano Sanchez, EfrainEfrainAltamirano SanchezDe Gendt, StefanStefanDe Gendt2022-06-242021-11-302022-06-242021-02nahttps://imec-publications.be/handle/20.500.12860/38503Surface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H2O2 SolutionsProceedings paperMaterials science