Xu, KaidongKaidongXuVos, RitaRitaVosVereecke, GuyGuyVereeckeFyen, WimWimFyenHolsteyns, FrankFrankHolsteynsDoumen, GeertGeertDoumenMertens, PaulPaulMertensHeyns, MarcMarcHeynsVinckier, ChrisChrisVinckierFransaer, J.J.Fransaer2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9945Particle adhesion and removal mechanisms during brush scrubber cleaning in post-CMP processesProceedings paper