Shi, XiaopingXiaopingShiRothschild, AudeAudeRothschildEveraert, Jean-LucJean-LucEveraertVan Elshocht, SvenSvenVan ElshochtDate, LucienLucienDateSchreutelkamp, RobRobSchreutelkampSchaekers, MarcMarcSchaekers2021-10-162021-10-162007-10https://imec-publications.be/handle/20.500.12860/12888Scaling down of MOCVD HfSiON to 1nm EOTProceedings paper