Fabrication of porogen residue free ultra low-k PECVD material by subsequent H2-afterglow plasma treatment and UV curing

Urbanowicz, AdamAdamUrbanowiczVanstreels, KrisKrisVanstreelsVerdonck, PatrickPatrickVerdonckShamiryan, DenisDenisShamiryanCremel, MaximeMaximeCremelDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18116Fabrication of porogen residue free ultra low-k PECVD material by subsequent H2-afterglow plasma treatment and UV curingProceedings paper