Effect of postdeposition anneal conditions on defect density of HfO2 layers measured by wet etching

Claes, MartineMartineClaesDe Gendt, StefanStefanDe GendtWitters, ThomasThomasWittersKaushik, VidyaVidyaKaushikConard, ThierryThierryConardZhao, ChaoChaoZhaoManabe, Y.Y.ManabeDelabie, AnneliesAnneliesDelabieRöhr, ErikaErikaRöhrChen, JerryJerryChenTsai, WilmanWilmanTsaiHeyns, MarcMarcHeyns2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8687Effect of postdeposition anneal conditions on defect density of HfO2 layers measured by wet etchingJournal article