Lafferty, NealNealLaffertyAdam, KostasKostasAdamGranik, YuriYuriGranikTorres, AndresAndresTorresMaurer, WilhelmWilhelmMaurer2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10732Physically-based compact models for fast lithography simulationProceedings paper