Maenhoudt, MireilleMireilleMaenhoudtVangoidsenhoven, DizianaDizianaVangoidsenhovenVandeweyer, TomTomVandeweyerGronheid, RoelRoelGronheidVersluijs, JankoJankoVersluijsMiller, AndyAndyMiller2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14087Double patterning process development at IMECOral presentation