Driessen, FrankFrankDriessenPhilipsen, VickyVickyPhilipsenJonckheere, RikRikJonckheereLiu, Hua-YuHua-YuLiuKarklin, LinardLinardKarklin2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6287Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm nodeProceedings paper