Vanadium oxide thin films grown by ALD using TEMAV and O3 or H2O precursors

Peter, AntonyAntonyPeterToeller, MichaelMichaelToellerRadu, IulianaIulianaRaduAdelmann, ChristophChristophAdelmannSchaekers, MarcMarcSchaekersMeersschaut, JohanJohanMeersschautConard, ThierryThierryConardJurczak, GosiaGosiaJurczakVan Elshocht, SvenSvenVan Elshocht2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21285Vanadium oxide thin films grown by ALD using TEMAV and O3 or H2O precursorsMeeting abstract