Vandeweyer, TomTomVandeweyerBaerts, ChristinaChristinaBaertsHoriguchi, NaotoNaotoHoriguchiErcken, MoniqueMoniqueErcken2021-10-192021-10-1920110167-9317https://imec-publications.be/handle/20.500.12860/20023New lithographic requirements for the implant levels in scaled devicesJournal article