Progress in qualifying and quantifying the airborne base sensitivity of modern chemically amplified DUV photoresists

Kinkead, D. A.D. A.KinkeadErcken, MoniqueMoniqueErcken2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4471Progress in qualifying and quantifying the airborne base sensitivity of modern chemically amplified DUV photoresistsProceedings paper