OPC and Modeling Solution to Support 0.55NA EUV Stitching

Zeng, QinglinQinglinZengXu, DongboDongboXuZeng, XuefengXuefengZengGillijns, WernerWernerGillijnsTejnil, EditaEditaTejnilSun, YuyangYuyangSunFenger, GermainGermainFenger2025-06-172025-05-112025-06-172024978-1-5106-8155-20277-786XWOS:001467876500006https://imec-publications.be/handle/20.500.12860/45642OPC and Modeling Solution to Support 0.55NA EUV StitchingProceedings paper10.1117/12.3034957978-1-5106-8156-9WOS:001467876500006