A DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier

Zhao, ChaoChaoZhaoAhn, Jae YoungJae YoungAhnHoriguchi, NaotoNaotoHoriguchiDemuynck, StevenStevenDemuynckTokei, ZsoltZsoltTokei2021-10-172021-10-1720080167-9317https://imec-publications.be/handle/20.500.12860/14844A DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrierJournal article