Exploration of BEOL line-space patterning options at 12nm half-pitch and below

Decoster, StefanStefanDecosterLazzarino, FredericFredericLazzarinoPetersen Barbosa Lima, LucasLucasPetersen Barbosa LimaLi, WaikinWaikinLiVersluijs, JankoJankoVersluijsHalder, SandipSandipHalderMallik, ArindamArindamMallikMurdoch, GayleGayleMurdoch2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30573Exploration of BEOL line-space patterning options at 12nm half-pitch and belowProceedings paperhttps://doi.org/10.1117/12.2297183