Mechanisms of TiN effective workfunction tuning at interfaces with HfO2 and SiO2

Filatova, ElenaElenaFilatovaKonashuk, AlekseiAlekseiKonashukSakhonenkov, SergeiSergeiSakhonenkovGaisin, AidarAidarGaisinKolomiiets, NadiaNadiaKolomiietsAfanas'ev, VeleriVeleriAfanas'evDekkers, HaroldHaroldDekkers2021-10-282021-10-2820201932-7447https://imec-publications.be/handle/20.500.12860/35123Mechanisms of TiN effective workfunction tuning at interfaces with HfO2 and SiO2Journal article10.1021/acs.jpcc.0c03605