Biesemans, SergeSergeBiesemansHendriks, MartonMartonHendriksKubicek, StefanStefanKubicekDe Meyer, KristinKristinDe Meyer2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1091Accurate determination of channel length, series resistance and junction doping profile for MOSFET optimisation in deep submicron technologiesProceedings paper