Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection

Chakroun, ImenImenChakrounAshby, TomTomAshbyDas, SayantanSayantanDasHalder, SandipSandipHalderWuyts, RoelRoelWuytsVerachtert, WilfriedWilfriedVerachtert2022-01-272021-11-022022-01-272020naWOS:000615717400031https://imec-publications.be/handle/20.500.12860/38204Using Unsupervised Machine Learning for Plasma Etching Endpoint DetectionProceedings paper10.5220/0008877502730279978-989-758-397-1WOS:000615717400031