Spacer defined double patterning for (sub-)20nm half pitch single damascene structures

Versluijs, JankoJankoVersluijsSiew, Yong KongYong KongSiewKunnen, EddyEddyKunnenVangoidsenhoven, DizianaDizianaVangoidsenhovenDemuynck, StevenStevenDemuynckWiaux, VincentVincentWiauxDekkers, HaroldHaroldDekkersBeyer, GeraldGeraldBeyer2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20086Spacer defined double patterning for (sub-)20nm half pitch single damascene structuresProceedings paper