Oxide CMP steps in the integration of vertical Si nanowire tunnelFET devices

Devriendt, KatiaKatiaDevriendtOng, PatrickPatrickOngLee, WillieWillieLeeRooyackers, RitaRitaRooyackersVandooren, AnneAnneVandoorenDe Gendt, StefanStefanDe GendtLeunissen, PeterPeterLeunissen2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17021Oxide CMP steps in the integration of vertical Si nanowire tunnelFET devicesProceedings paper