New cleaning solutions for all-wet-post etch residue removal on Cu BEOL for sub 45nm nodes

Klipp, AndreasAndreasKlippVereecke, GuyGuyVereeckeLe, Quoc ToanQuoc ToanLeClaes, MartineMartineClaes2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15607New cleaning solutions for all-wet-post etch residue removal on Cu BEOL for sub 45nm nodesProceedings paper