Iino, H.H.IinoOgawa, Y.Y.OgawaMasaoka, T.T.MasaokaLe, Quoc ToanQuoc ToanLeKesters, ElsElsKestersRip, JensJensRipOniki, YusukeYusukeOnikiAkanishi, Y.Y.AkanishiIwasaki, AkihisaAkihisaIwasakiHolsteyns, FrankFrankHolsteyns2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30934Optimization of post etch cobalt compatible clean by pH and oxidizerProceedings paperhttps://www.scientific.net/SSP.282.268