Novel method to achieve area selective ALD on copper metal vs. SiO2using vapor-phase deposited SAMS

Lecordier, LaurentLaurentLecordierArmini, SilviaSilviaArmini2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26883Novel method to achieve area selective ALD on copper metal vs. SiO2using vapor-phase deposited SAMSMeeting abstract