Resist surface investigations for reduction of line-edge-roughness in surface imaging technology

Sugihara, TakashiTakashiSugiharaVan Roey, FriedaFriedaVan RoeyGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonseVan den hove, LucLucVan den hove2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2990Resist surface investigations for reduction of line-edge-roughness in surface imaging technologyOral presentation