Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium

Vandenbroucke, SofieSofieVandenbrouckeLevrau, ElisabethElisabethLevrauMinjauw, MatthiasMatthiasMinjauwSolano Minuesa, EduardoEduardoSolano MinuesaVan de Kerckhove, KevinKevinVan de KerckhoveDevloo-Casier, KilianKilianDevloo-CasierPulinthanathu Sree, SreeprasantSreeprasantPulinthanathu SreeMartens, Johan A.Johan A.MartensVos, RitaRitaVosJans, KarolienKarolienJansDendooven, JolienJolienDendoovenVereecken, PhilippePhilippeVereeckenStakenborg, TimTimStakenborgDetavernier, ChristopheChristopheDetavernier2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/34291Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titaniumMeeting abstracthttp://hdl.handle.net/1854/LU-8625841