AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35

Hendrickx, EricEricHendrickxBirkner, R.R.BirknerKempsell, MonicaMonicaKempsellTritchkov, A.A.TritchkovVandenberghe, GeertGeertVandenbergheScheruebl, T.T.Scheruebl2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13854AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35Proceedings paper