De Schepper, PeterPeterDe SchepperEl Otell, ZiadZiadEl Otellde Marneffe, Jean-FrancoisJean-Francoisde MarneffeAltamirano Sanchez, EfrainEfrainAltamirano SanchezDe Gendt, StefanStefanDe Gendt2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23720The influence of hydrogen plasma treatment on LWR mitigation: The importance of EUV photoresist compositionMeeting abstract