Aoulaiche, MarcMarcAoulaicheHoussa, MichelMichelHoussaConard, ThierryThierryConardDe Gendt, StefanStefanDe GendtGroeseneken, GuidoGuidoGroesenekenMaes, HermanHermanMaesHeyns, MarcMarcHeyns2021-10-162021-10-162007-03https://imec-publications.be/handle/20.500.12860/11647Postdeposition-anneal effect on negative bias temperature instability in HfSiON gate stacksJournal article