Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography

Belete, ZelalemZelalemBeleteDe Bisschop, PeterPeterDe BisschopWelling, UlrichUlrichWellingErdmann, AndreasAndreasErdmann2022-02-212022-02-2120211932-5150WOS:000641162500011https://imec-publications.be/handle/20.500.12860/38943Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithographyJournal article review10.1117/1.JMM.20.1.014801WOS:000641162500011EXCHANGE