Nistor, L.C.L.C.NistorRichard, OlivierOlivierRichardZhao, ChaoChaoZhaoBender, HugoHugoBenderVan Tendeloo, G.G.Van Tendeloo2021-10-162021-10-162005-07https://imec-publications.be/handle/20.500.12860/10932The thermal stability of ALD Zr:Al mixed oxide thin films: an in situ TEM studyJournal article