Guiding Principles for the Design of a Chemical Vapor Deposition Process for Highly Crystalline Transition Metal Dichalcogenides

Voronenkov, VladislavVladislavVoronenkovGroven, BenjaminBenjaminGrovenMedina Silva, HenryHenryMedina SilvaMorin, PierrePierreMorinDe Gendt, StefanStefanDe Gendt2024-09-252024-03-272024-09-2520241862-6300WOS:001181099700001https://imec-publications.be/handle/20.500.12860/43736Guiding Principles for the Design of a Chemical Vapor Deposition Process for Highly Crystalline Transition Metal DichalcogenidesJournal article10.1002/pssa.202300943WOS:001181099700001SELECTIVE-AREA GROWTHMOS2 THIN-FILMSATOMIC LAYERSMOLYBDENUMTRANSPORTPRESSUREWATERVOLATILIZATIONNUCLEATIONHETEROSTRUCTURES